Notice: This Wiki is now read only and edits are no longer possible. Please see: https://gitlab.eclipse.org/eclipsefdn/helpdesk/-/wikis/Wiki-shutdown-plan for the plan.
Difference between revisions of "EEF"
(New page: = Extended Editing Framework - EEF = == Presentation == The EEF project is part of EMFT (EMF Technology). EEF provides a generative component and runtime infrastructure for developing a...) |
(→Extended Editing Framework - EEF) |
||
Line 1: | Line 1: | ||
− | |||
− | |||
== Presentation == | == Presentation == | ||
Revision as of 12:36, 12 August 2009
Presentation
The EEF project is part of EMFT (EMF Technology).
EEF provides a generative component and runtime infrastructure for developing advanced components to ease the EMF based model editing. It is composed of three parts :
- A runtime containing a set of advanced widgets and a generic and extensible MVC architecture
- Standard metamodels allowing the definition of models that will parameterize the actual editing components that are to be generated
- A Acceleo module generating a standard architecture extending the framework's runtime.
The generated elements can be integrated in any SWT/JFace components to ease the EMF model based editing.